The broadest range of high sensitivity AMC detection by a single instrument
Successful fabrication of semiconductors, photovoltaics and LCD/LED panels requires extremely high-precision manufacturing equipment, operated in an ultra-clean environment. Volatile or semi-volatile contaminants in the production environment can degrade semiconductor performance and/or greatly shorten expensive maintenance cycles or operational service of fabrication equipment. SIFT-MS technology provides rapid, high-sensitivity analysis of the widest range of airborne molecular contaminants (AMCs) available to the semiconductor industry, greatly reducing product loss and equipment failure.

Benefits of SIFT-MS for Cleanroom Monitoring

A single instrument to monitor for a broad range of chemically diverse AMCs

Simple integration with existing sample delivery infrastructure (single or multiple point)

24/7 operation with minimal downtime (<1% downtime for validation)

High selectivity and sensitivity (detection limits in pptV range)

Real-time AMC monitoring provides instant feedback on contamination events