The most comprehensive online measurement of trace gases for high product yields.
Production of modern semiconductors at high yield requires ultra-high purity reagents, very low emission transportation and stringent air quality controls in the fab. The presence of airborne molecular contaminants (AMCs) in fabrication environments can ruin production batches. SIFT-MS provides real-time trace gas analysis of AMCs with the broadest range of volatile organic compound (VOCs) and inorganic gas detection available in a single instrument.
Semiconductor applications and use cases
SIFT-MS provides rapid, high-sensitivity analysis of a wide range of AMCs, greatly reducing product loss and equipment failure.Read More
SIFT-MS can be integrated with existing online gas monitoring systems, enabling faster and more thorough detection of trace volatile impurities in bulk and specialty gases.Read More
The rapid analysis provided by SIFT-MS instruments can be utilized to screen front opening unified pod (FOUP) components and completed assemblies prior to their use for transporting wafers.Read More
Syft is the answer to your Semiconductor AMC monitoring issues
Industry issueContinuous monitoring of AMCs is critical to ensuring the integrity of fab production environments. Legacy detectors and sensors tend to be slow or inflexible, leading to missed AMC contamination events that damage precious product.
Competitive benefitSIFT-MS covers a wide range of fab monitoring applications with fast, flexible solutions that can keep up with changing process monitoring needs over the lifetime of your fab. Each step in your production process can be tightly controlled by SIFT-MS real-time trace gas detection whether it’s in the plenum, cleanroom, interstitial space, or subfab. Monitor for ammonia, ethanolamine, SOX compounds, or any other AMCs.
Industry impactReal-time, rapid, and dynamic trace gas detection ensures that AMC contamination events are not missed, avoiding loss of yield and production batch write-offs.
Semiconductor AMC Monitoring
The unique attributes of SIFT-MS enable the speciation and quantitation of volatile compounds in real-time, providing a single solution for online monitoring of clean room relevant organic and inorganic airborne molecular contaminants (AMCs) down to parts-per-trillion by volume (pptv) levels in semiconductor fabs. Learn how to detect AMCs when they happen and never miss a contamination event again.
Cleanroom Air Quality Monitoring
SIFT-MS is a unique analytical solution that provides comprehensive, high-sensitivity detection of volatile organic and inorganic gases (including HCl, HF, and SOx) within seconds. As a single, comprehensive instrument with rapid analysis, SIFT-MS provides great economic benefit. This webinar describes the application of SIFT-MS to AMC monitoring – from the front-opening unified pod (FOUP) to the clean room.
Semiconductor Bulk Gas Analysis
Real-time monitoring of gas streams using selected ion flow tube mass spectrometry (SIFT-MS) provides continuous product quality feedback. This application note describes how SIFT-MS SCAN analysis coupled with multivariate statistical analysis readily detects untargeted defects in semiconductor manufacturing “bulk gas.”
Instant Detection of Non-Conforming Raw Materials Using SIFT-MS: A Semiconductor Industry
SIFT-MS can continuously analyze volatiles that indicate non-conformance of raw materials, such as bulk gases utilized in semiconductor manufacture. This webinar describes how SIFT-MS can be deployed in both targeted and un-targeted operational modes to enhance quality assurance and increase yields, via continuous monitoring.
What’s in Your Fab Air?
SIFT-MS provides online AMC monitoring solutions for Fab environmental control. Detect volatile organic compounds (VOCs) and inorganic acids instantly with trace level sensitivity. Learn how SIFT-MS provides real-time detection of airborne molecular contaminants through a single instrument solution. Never miss a contamination event again.